Arnaud Allézy
Mechanical Engineer
Arnaud is a mechanical engineer with more than 15 years of experience in semiconductor manufacturing tools and X-ray instrumentation, with deep expertise in the dynamics of complex systems. He joined the Engineering Division at Lawrence Berkeley National Laboratory in 2010, where he supports the Center for X-Ray Optics in advancing the frontiers of extreme ultraviolet (EUV) lithography and semiconductor metrology.
Over the past decade, Arnaud has played a central role in the design, delivery, and commissioning of multiple EUV lithography and mask-imaging systems, including the MET5 EUV projection lithography tool and the AIRES and TPI EUV mask imaging microscopes. His work has been instrumental in enabling state-of-the-art patterning and characterization capabilities in support of next-generation semiconductor research.
In addition to his work with CXRO, Arnaud currently oversees major mechanical and systems upgrades across more than 30 beamlines as part of the ALS-U project. Prior to joining LBNL, he worked on the dynamics of space telescopes at Thales Alenia Space in France. Arnaud received his PhD in Mechanical Engineering in 2006 from the National Institute of Applied Sciences (INSA) in Lyon, France.